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a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d <t>FDTD</t> simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.
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a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d <t>FDTD</t> simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.
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a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d <t>FDTD</t> simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.
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a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d <t>FDTD</t> simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.
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a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d FDTD simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.

Journal: Nature Communications

Article Title: Schlieren texture and topography induced confinement in an organic exciton-polariton laser

doi: 10.1038/s41467-025-55875-1

Figure Lengend Snippet: a AFM measurement performed on the surface of the DBR/DBR Schlieren cavity showing an average roughness R a = 2.6 nm. Scale bar, 2 μm. b TMCs of the reflectivity of DBR/DBR cavities with aligned 15% β-phase PFO at the design thickness for a resonance at 2.65 eV (red line) and assuming a 3 nm thickness increase over the design thickness (blue line). The calculation was performed for light polarized parallel to the alignment of the PFO transition dipole moment. c Calculated LP energy profile for a randomly generated film topography with a correlation length and amplitude matching the Schlieren cavity measured in ( a ). d FDTD simulation of the normalized squared electric field 1443 fs after excitation for the LP energy profile shown in ( c ). e Superposition of data from ( c and d ) illustrating how the electric field is confined to regions of lower LP energy, i.e., to thicker parts of the film.

Article Snippet: The simulations were performed using the FDTD 3D Electromagnetic Simulator from Lumerical-Ansys.

Techniques: Generated